Characterization of ZrO2 Buffer Layers for Sequentially Evaporated Y-Ba-Cu-O on Si and Al2O3 Substrates View Full Text


Ontology type: schema:Chapter      Open Access: True


Chapter Info

DATE

1989

AUTHORS

George J. Valco , Norman J. Rohrer , John J. Pouch , Joseph D. Warner , Kul B. Bhasin

ABSTRACT

A large variety of techniques have been employed for the formation of thin films of the high temperature superconducting oxides on many different substrates. These efforts have been driven by the desire to investigate and develop electronic applications of these materials. Several of the substrates that have been used possess undesirable electronic properties, such as the large dielectric constant of SrTiO3. For many applications it is desirable to obtain the superconducting films on silicon or, for high frequency applications, on substrates such as Al2O3 or GaAs. Unfortunately, the deleterious interactions between the films and these substrates or common dielectrics1, such as silicon dioxide, result in unacceptable degradation of both the superconductor and the substrate. This has led to the investigation of the use of thin films of materials such as ZrO2 2 or silver3 as buffer layers between the superconductor and the substrate. More... »

PAGES

377-386

Book

TITLE

Science and Technology of Thin Film Superconductors

ISBN

978-1-4684-5660-8
978-1-4684-5658-5

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/978-1-4684-5658-5_45

DOI

http://dx.doi.org/10.1007/978-1-4684-5658-5_45

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1039028502


Indexing Status Check whether this publication has been indexed by Scopus and Web Of Science using the SN Indexing Status Tool
Incoming Citations Browse incoming citations for this publication using opencitations.net

JSON-LD is the canonical representation for SciGraph data.

TIP: You can open this SciGraph record using an external JSON-LD service: JSON-LD Playground Google SDTT

[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0912", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Materials Engineering", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/09", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Engineering", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "The Ohio State University", 
          "id": "https://www.grid.ac/institutes/grid.261331.4", 
          "name": [
            "Department of Electrical Engineering, The Ohio State University, Columbus, Ohio\u00a043210, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Valco", 
        "givenName": "George J.", 
        "id": "sg:person.016521265346.11", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016521265346.11"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "The Ohio State University", 
          "id": "https://www.grid.ac/institutes/grid.261331.4", 
          "name": [
            "Department of Electrical Engineering, The Ohio State University, Columbus, Ohio\u00a043210, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Rohrer", 
        "givenName": "Norman J.", 
        "id": "sg:person.011467540753.98", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011467540753.98"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Glenn Research Center", 
          "id": "https://www.grid.ac/institutes/grid.419077.c", 
          "name": [
            "National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio\u00a044135, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Pouch", 
        "givenName": "John J.", 
        "id": "sg:person.015444302467.20", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015444302467.20"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Glenn Research Center", 
          "id": "https://www.grid.ac/institutes/grid.419077.c", 
          "name": [
            "National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio\u00a044135, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Warner", 
        "givenName": "Joseph D.", 
        "id": "sg:person.013073041063.41", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013073041063.41"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "Glenn Research Center", 
          "id": "https://www.grid.ac/institutes/grid.419077.c", 
          "name": [
            "National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio\u00a044135, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Bhasin", 
        "givenName": "Kul B.", 
        "id": "sg:person.013272166527.36", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013272166527.36"
        ], 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "https://doi.org/10.1143/jjap.27.l1524", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1063043378"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "1989", 
    "datePublishedReg": "1989-01-01", 
    "description": "A large variety of techniques have been employed for the formation of thin films of the high temperature superconducting oxides on many different substrates. These efforts have been driven by the desire to investigate and develop electronic applications of these materials. Several of the substrates that have been used possess undesirable electronic properties, such as the large dielectric constant of SrTiO3. For many applications it is desirable to obtain the superconducting films on silicon or, for high frequency applications, on substrates such as Al2O3 or GaAs. Unfortunately, the deleterious interactions between the films and these substrates or common dielectrics1, such as silicon dioxide, result in unacceptable degradation of both the superconductor and the substrate. This has led to the investigation of the use of thin films of materials such as ZrO2 2 or silver3 as buffer layers between the superconductor and the substrate.", 
    "editor": [
      {
        "familyName": "McConnell", 
        "givenName": "Robert D.", 
        "type": "Person"
      }, 
      {
        "familyName": "Wolf", 
        "givenName": "Stuart A.", 
        "type": "Person"
      }
    ], 
    "genre": "chapter", 
    "id": "sg:pub.10.1007/978-1-4684-5658-5_45", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": true, 
    "isPartOf": {
      "isbn": [
        "978-1-4684-5660-8", 
        "978-1-4684-5658-5"
      ], 
      "name": "Science and Technology of Thin Film Superconductors", 
      "type": "Book"
    }, 
    "name": "Characterization of ZrO2 Buffer Layers for Sequentially Evaporated Y-Ba-Cu-O on Si and Al2O3 Substrates", 
    "pagination": "377-386", 
    "productId": [
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1007/978-1-4684-5658-5_45"
        ]
      }, 
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "b9e954cd603282b226e4e9fae7ee48e46d8f7065ed100648c057d3d8c762d4e5"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1039028502"
        ]
      }
    ], 
    "publisher": {
      "location": "Boston, MA", 
      "name": "Springer US", 
      "type": "Organisation"
    }, 
    "sameAs": [
      "https://doi.org/10.1007/978-1-4684-5658-5_45", 
      "https://app.dimensions.ai/details/publication/pub.1039028502"
    ], 
    "sdDataset": "chapters", 
    "sdDatePublished": "2019-04-15T15:22", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000001_0000000264/records_8672_00000267.jsonl", 
    "type": "Chapter", 
    "url": "http://link.springer.com/10.1007/978-1-4684-5658-5_45"
  }
]
 

Download the RDF metadata as:  json-ld nt turtle xml License info

HOW TO GET THIS DATA PROGRAMMATICALLY:

JSON-LD is a popular format for linked data which is fully compatible with JSON.

curl -H 'Accept: application/ld+json' 'https://scigraph.springernature.com/pub.10.1007/978-1-4684-5658-5_45'

N-Triples is a line-based linked data format ideal for batch operations.

curl -H 'Accept: application/n-triples' 'https://scigraph.springernature.com/pub.10.1007/978-1-4684-5658-5_45'

Turtle is a human-readable linked data format.

curl -H 'Accept: text/turtle' 'https://scigraph.springernature.com/pub.10.1007/978-1-4684-5658-5_45'

RDF/XML is a standard XML format for linked data.

curl -H 'Accept: application/rdf+xml' 'https://scigraph.springernature.com/pub.10.1007/978-1-4684-5658-5_45'


 

This table displays all metadata directly associated to this object as RDF triples.

104 TRIPLES      23 PREDICATES      28 URIs      20 LITERALS      8 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1007/978-1-4684-5658-5_45 schema:about anzsrc-for:09
2 anzsrc-for:0912
3 schema:author Nabd0fb9857634e99a83b8ea7a60d8e92
4 schema:citation https://doi.org/10.1143/jjap.27.l1524
5 schema:datePublished 1989
6 schema:datePublishedReg 1989-01-01
7 schema:description A large variety of techniques have been employed for the formation of thin films of the high temperature superconducting oxides on many different substrates. These efforts have been driven by the desire to investigate and develop electronic applications of these materials. Several of the substrates that have been used possess undesirable electronic properties, such as the large dielectric constant of SrTiO3. For many applications it is desirable to obtain the superconducting films on silicon or, for high frequency applications, on substrates such as Al2O3 or GaAs. Unfortunately, the deleterious interactions between the films and these substrates or common dielectrics1, such as silicon dioxide, result in unacceptable degradation of both the superconductor and the substrate. This has led to the investigation of the use of thin films of materials such as ZrO2 2 or silver3 as buffer layers between the superconductor and the substrate.
8 schema:editor N095e88bb8fa34a3ba3bb1a743ccea2e6
9 schema:genre chapter
10 schema:inLanguage en
11 schema:isAccessibleForFree true
12 schema:isPartOf N7a770baa93b447b7ba234868b7158104
13 schema:name Characterization of ZrO2 Buffer Layers for Sequentially Evaporated Y-Ba-Cu-O on Si and Al2O3 Substrates
14 schema:pagination 377-386
15 schema:productId N4d83e9b470dc400e8369bec9f0dff808
16 Nb9ff84b9d84b4aaaa923b2785e56124f
17 Nfbe9f888b5734aa0b361e1fd6b64c5be
18 schema:publisher N3aab442401c84663af0007d00ebea175
19 schema:sameAs https://app.dimensions.ai/details/publication/pub.1039028502
20 https://doi.org/10.1007/978-1-4684-5658-5_45
21 schema:sdDatePublished 2019-04-15T15:22
22 schema:sdLicense https://scigraph.springernature.com/explorer/license/
23 schema:sdPublisher N964b4e264a6c4cc5bf8890b0cb5fefdc
24 schema:url http://link.springer.com/10.1007/978-1-4684-5658-5_45
25 sgo:license sg:explorer/license/
26 sgo:sdDataset chapters
27 rdf:type schema:Chapter
28 N095e88bb8fa34a3ba3bb1a743ccea2e6 rdf:first N13f41f04586248ba92807584a136842b
29 rdf:rest Nf55aee93c0a34049b94ea2e1cc723bee
30 N13f41f04586248ba92807584a136842b schema:familyName McConnell
31 schema:givenName Robert D.
32 rdf:type schema:Person
33 N2978fcde7dbd4595b3458177ceb1caaa rdf:first sg:person.013073041063.41
34 rdf:rest N386be01418194c178d24142df4c78787
35 N386be01418194c178d24142df4c78787 rdf:first sg:person.013272166527.36
36 rdf:rest rdf:nil
37 N3aab442401c84663af0007d00ebea175 schema:location Boston, MA
38 schema:name Springer US
39 rdf:type schema:Organisation
40 N4d83e9b470dc400e8369bec9f0dff808 schema:name dimensions_id
41 schema:value pub.1039028502
42 rdf:type schema:PropertyValue
43 N7a770baa93b447b7ba234868b7158104 schema:isbn 978-1-4684-5658-5
44 978-1-4684-5660-8
45 schema:name Science and Technology of Thin Film Superconductors
46 rdf:type schema:Book
47 N964b4e264a6c4cc5bf8890b0cb5fefdc schema:name Springer Nature - SN SciGraph project
48 rdf:type schema:Organization
49 N9b38c494876b4168925fedb1ee4b52e9 rdf:first sg:person.011467540753.98
50 rdf:rest Nd8ff70deb3bc466a8b6021737d60be27
51 Na1454de7e2654e68a6204cb04e29ceb0 schema:familyName Wolf
52 schema:givenName Stuart A.
53 rdf:type schema:Person
54 Nabd0fb9857634e99a83b8ea7a60d8e92 rdf:first sg:person.016521265346.11
55 rdf:rest N9b38c494876b4168925fedb1ee4b52e9
56 Nb9ff84b9d84b4aaaa923b2785e56124f schema:name readcube_id
57 schema:value b9e954cd603282b226e4e9fae7ee48e46d8f7065ed100648c057d3d8c762d4e5
58 rdf:type schema:PropertyValue
59 Nd8ff70deb3bc466a8b6021737d60be27 rdf:first sg:person.015444302467.20
60 rdf:rest N2978fcde7dbd4595b3458177ceb1caaa
61 Nf55aee93c0a34049b94ea2e1cc723bee rdf:first Na1454de7e2654e68a6204cb04e29ceb0
62 rdf:rest rdf:nil
63 Nfbe9f888b5734aa0b361e1fd6b64c5be schema:name doi
64 schema:value 10.1007/978-1-4684-5658-5_45
65 rdf:type schema:PropertyValue
66 anzsrc-for:09 schema:inDefinedTermSet anzsrc-for:
67 schema:name Engineering
68 rdf:type schema:DefinedTerm
69 anzsrc-for:0912 schema:inDefinedTermSet anzsrc-for:
70 schema:name Materials Engineering
71 rdf:type schema:DefinedTerm
72 sg:person.011467540753.98 schema:affiliation https://www.grid.ac/institutes/grid.261331.4
73 schema:familyName Rohrer
74 schema:givenName Norman J.
75 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.011467540753.98
76 rdf:type schema:Person
77 sg:person.013073041063.41 schema:affiliation https://www.grid.ac/institutes/grid.419077.c
78 schema:familyName Warner
79 schema:givenName Joseph D.
80 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013073041063.41
81 rdf:type schema:Person
82 sg:person.013272166527.36 schema:affiliation https://www.grid.ac/institutes/grid.419077.c
83 schema:familyName Bhasin
84 schema:givenName Kul B.
85 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.013272166527.36
86 rdf:type schema:Person
87 sg:person.015444302467.20 schema:affiliation https://www.grid.ac/institutes/grid.419077.c
88 schema:familyName Pouch
89 schema:givenName John J.
90 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015444302467.20
91 rdf:type schema:Person
92 sg:person.016521265346.11 schema:affiliation https://www.grid.ac/institutes/grid.261331.4
93 schema:familyName Valco
94 schema:givenName George J.
95 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.016521265346.11
96 rdf:type schema:Person
97 https://doi.org/10.1143/jjap.27.l1524 schema:sameAs https://app.dimensions.ai/details/publication/pub.1063043378
98 rdf:type schema:CreativeWork
99 https://www.grid.ac/institutes/grid.261331.4 schema:alternateName The Ohio State University
100 schema:name Department of Electrical Engineering, The Ohio State University, Columbus, Ohio 43210, USA
101 rdf:type schema:Organization
102 https://www.grid.ac/institutes/grid.419077.c schema:alternateName Glenn Research Center
103 schema:name National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio 44135, USA
104 rdf:type schema:Organization
 




Preview window. Press ESC to close (or click here)


...