Non-Destructive Evaluation in Manufacturing using Spectroscopic Ellipsometry View Full Text


Ontology type: schema:Chapter      Open Access: True


Chapter Info

DATE

1991

AUTHORS

John A. Woollam , Paul G. Snyder

ABSTRACT

The manufacture of optical coatings, computer disks, as well as advanced electronic multilayered devices and circuit structures requires high precision in the measurement and control of thicknesses and interfacial and surface roughnesses. Variable angle spectroscopic ellipsometry (VASE) is non-destructive and monolayer sensitive. VASE uses polarized light, and the technique can be applied in nearly any ambient, including air, vacuum, or corrosive environment. Applications to coated window glass, space protective coatings, semiconductor device, as well as sputtered media computer disk manufacturing are discussed. At the present time these NDE measurements are mainly ex situ, but in situ (during deposition) applications are being rapidly developed. More... »

PAGES

2185-2191

Book

TITLE

Review of Progress in Quantitative Nondestructive Evaluation

ISBN

978-1-4613-6666-9
978-1-4615-3742-7

Author Affiliations

Identifiers

URI

http://scigraph.springernature.com/pub.10.1007/978-1-4615-3742-7_138

DOI

http://dx.doi.org/10.1007/978-1-4615-3742-7_138

DIMENSIONS

https://app.dimensions.ai/details/publication/pub.1036765229


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[
  {
    "@context": "https://springernature.github.io/scigraph/jsonld/sgcontext.json", 
    "about": [
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/0299", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Other Physical Sciences", 
        "type": "DefinedTerm"
      }, 
      {
        "id": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/02", 
        "inDefinedTermSet": "http://purl.org/au-research/vocabulary/anzsrc-for/2008/", 
        "name": "Physical Sciences", 
        "type": "DefinedTerm"
      }
    ], 
    "author": [
      {
        "affiliation": {
          "alternateName": "University of Nebraska\u2013Lincoln", 
          "id": "https://www.grid.ac/institutes/grid.24434.35", 
          "name": [
            "Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE\u00a068588-0511, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Woollam", 
        "givenName": "John A.", 
        "id": "sg:person.015162055621.34", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015162055621.34"
        ], 
        "type": "Person"
      }, 
      {
        "affiliation": {
          "alternateName": "University of Nebraska\u2013Lincoln", 
          "id": "https://www.grid.ac/institutes/grid.24434.35", 
          "name": [
            "Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE\u00a068588-0511, USA"
          ], 
          "type": "Organization"
        }, 
        "familyName": "Snyder", 
        "givenName": "Paul G.", 
        "id": "sg:person.07451362255.47", 
        "sameAs": [
          "https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.07451362255.47"
        ], 
        "type": "Person"
      }
    ], 
    "citation": [
      {
        "id": "https://doi.org/10.1016/0038-1101(88)90091-3", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1026149857"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/0038-1101(88)90091-3", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1026149857"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/0040-6090(86)90212-9", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1038521396"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1016/0040-6090(86)90212-9", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1038521396"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.1141417", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057669088"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.337695", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057943888"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.342491", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057949781"
        ], 
        "type": "CreativeWork"
      }, 
      {
        "id": "https://doi.org/10.1063/1.344765", 
        "sameAs": [
          "https://app.dimensions.ai/details/publication/pub.1057953256"
        ], 
        "type": "CreativeWork"
      }
    ], 
    "datePublished": "1991", 
    "datePublishedReg": "1991-01-01", 
    "description": "The manufacture of optical coatings, computer disks, as well as advanced electronic multilayered devices and circuit structures requires high precision in the measurement and control of thicknesses and interfacial and surface roughnesses. Variable angle spectroscopic ellipsometry (VASE) is non-destructive and monolayer sensitive. VASE uses polarized light, and the technique can be applied in nearly any ambient, including air, vacuum, or corrosive environment. Applications to coated window glass, space protective coatings, semiconductor device, as well as sputtered media computer disk manufacturing are discussed. At the present time these NDE measurements are mainly ex situ, but in situ (during deposition) applications are being rapidly developed.", 
    "editor": [
      {
        "familyName": "Thompson", 
        "givenName": "Donald O.", 
        "type": "Person"
      }, 
      {
        "familyName": "Chimenti", 
        "givenName": "Dale E.", 
        "type": "Person"
      }
    ], 
    "genre": "chapter", 
    "id": "sg:pub.10.1007/978-1-4615-3742-7_138", 
    "inLanguage": [
      "en"
    ], 
    "isAccessibleForFree": true, 
    "isPartOf": {
      "isbn": [
        "978-1-4613-6666-9", 
        "978-1-4615-3742-7"
      ], 
      "name": "Review of Progress in Quantitative Nondestructive Evaluation", 
      "type": "Book"
    }, 
    "name": "Non-Destructive Evaluation in Manufacturing using Spectroscopic Ellipsometry", 
    "pagination": "2185-2191", 
    "productId": [
      {
        "name": "doi", 
        "type": "PropertyValue", 
        "value": [
          "10.1007/978-1-4615-3742-7_138"
        ]
      }, 
      {
        "name": "readcube_id", 
        "type": "PropertyValue", 
        "value": [
          "af22c5d3dceba6ccdc64554776fc24bb74c72f8f2a14917464c173fb9c31edab"
        ]
      }, 
      {
        "name": "dimensions_id", 
        "type": "PropertyValue", 
        "value": [
          "pub.1036765229"
        ]
      }
    ], 
    "publisher": {
      "location": "Boston, MA", 
      "name": "Springer US", 
      "type": "Organisation"
    }, 
    "sameAs": [
      "https://doi.org/10.1007/978-1-4615-3742-7_138", 
      "https://app.dimensions.ai/details/publication/pub.1036765229"
    ], 
    "sdDataset": "chapters", 
    "sdDatePublished": "2019-04-15T10:36", 
    "sdLicense": "https://scigraph.springernature.com/explorer/license/", 
    "sdPublisher": {
      "name": "Springer Nature - SN SciGraph project", 
      "type": "Organization"
    }, 
    "sdSource": "s3://com-uberresearch-data-dimensions-target-20181106-alternative/cleanup/v134/2549eaecd7973599484d7c17b260dba0a4ecb94b/merge/v9/a6c9fde33151104705d4d7ff012ea9563521a3ce/jats-lookup/v90/0000000001_0000000264/records_8659_00000266.jsonl", 
    "type": "Chapter", 
    "url": "http://link.springer.com/10.1007/978-1-4615-3742-7_138"
  }
]
 

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This table displays all metadata directly associated to this object as RDF triples.

95 TRIPLES      23 PREDICATES      33 URIs      20 LITERALS      8 BLANK NODES

Subject Predicate Object
1 sg:pub.10.1007/978-1-4615-3742-7_138 schema:about anzsrc-for:02
2 anzsrc-for:0299
3 schema:author N3fdab14f03d84141b3ed7c3e5f5b1c9f
4 schema:citation https://doi.org/10.1016/0038-1101(88)90091-3
5 https://doi.org/10.1016/0040-6090(86)90212-9
6 https://doi.org/10.1063/1.1141417
7 https://doi.org/10.1063/1.337695
8 https://doi.org/10.1063/1.342491
9 https://doi.org/10.1063/1.344765
10 schema:datePublished 1991
11 schema:datePublishedReg 1991-01-01
12 schema:description The manufacture of optical coatings, computer disks, as well as advanced electronic multilayered devices and circuit structures requires high precision in the measurement and control of thicknesses and interfacial and surface roughnesses. Variable angle spectroscopic ellipsometry (VASE) is non-destructive and monolayer sensitive. VASE uses polarized light, and the technique can be applied in nearly any ambient, including air, vacuum, or corrosive environment. Applications to coated window glass, space protective coatings, semiconductor device, as well as sputtered media computer disk manufacturing are discussed. At the present time these NDE measurements are mainly ex situ, but in situ (during deposition) applications are being rapidly developed.
13 schema:editor Nf26a50dd7eeb4f4da761341aed5f0c89
14 schema:genre chapter
15 schema:inLanguage en
16 schema:isAccessibleForFree true
17 schema:isPartOf N42a0f15c76e34f259113ce86597801ca
18 schema:name Non-Destructive Evaluation in Manufacturing using Spectroscopic Ellipsometry
19 schema:pagination 2185-2191
20 schema:productId N52876cb89f38404fae7de1ca327a5027
21 N86e17ccb22d94325af6badbbe636f814
22 Ndaae4c43a72b462284e4d49510df8b7e
23 schema:publisher N9f0fa537b8b041289f05744500f7047d
24 schema:sameAs https://app.dimensions.ai/details/publication/pub.1036765229
25 https://doi.org/10.1007/978-1-4615-3742-7_138
26 schema:sdDatePublished 2019-04-15T10:36
27 schema:sdLicense https://scigraph.springernature.com/explorer/license/
28 schema:sdPublisher N6e49eb85701845879dd142db33fd4cac
29 schema:url http://link.springer.com/10.1007/978-1-4615-3742-7_138
30 sgo:license sg:explorer/license/
31 sgo:sdDataset chapters
32 rdf:type schema:Chapter
33 N0cf8346bd6e84aad99ec18ec432d8448 rdf:first N1c511c5e3a7f4423b7a1f2e7e95cb89b
34 rdf:rest rdf:nil
35 N1c511c5e3a7f4423b7a1f2e7e95cb89b schema:familyName Chimenti
36 schema:givenName Dale E.
37 rdf:type schema:Person
38 N3fdab14f03d84141b3ed7c3e5f5b1c9f rdf:first sg:person.015162055621.34
39 rdf:rest N57056646ec144158957ab4bf012d842d
40 N42a0f15c76e34f259113ce86597801ca schema:isbn 978-1-4613-6666-9
41 978-1-4615-3742-7
42 schema:name Review of Progress in Quantitative Nondestructive Evaluation
43 rdf:type schema:Book
44 N52876cb89f38404fae7de1ca327a5027 schema:name readcube_id
45 schema:value af22c5d3dceba6ccdc64554776fc24bb74c72f8f2a14917464c173fb9c31edab
46 rdf:type schema:PropertyValue
47 N57056646ec144158957ab4bf012d842d rdf:first sg:person.07451362255.47
48 rdf:rest rdf:nil
49 N6e49eb85701845879dd142db33fd4cac schema:name Springer Nature - SN SciGraph project
50 rdf:type schema:Organization
51 N863ce32f93ba49eca8ee3fd09ca84b11 schema:familyName Thompson
52 schema:givenName Donald O.
53 rdf:type schema:Person
54 N86e17ccb22d94325af6badbbe636f814 schema:name dimensions_id
55 schema:value pub.1036765229
56 rdf:type schema:PropertyValue
57 N9f0fa537b8b041289f05744500f7047d schema:location Boston, MA
58 schema:name Springer US
59 rdf:type schema:Organisation
60 Ndaae4c43a72b462284e4d49510df8b7e schema:name doi
61 schema:value 10.1007/978-1-4615-3742-7_138
62 rdf:type schema:PropertyValue
63 Nf26a50dd7eeb4f4da761341aed5f0c89 rdf:first N863ce32f93ba49eca8ee3fd09ca84b11
64 rdf:rest N0cf8346bd6e84aad99ec18ec432d8448
65 anzsrc-for:02 schema:inDefinedTermSet anzsrc-for:
66 schema:name Physical Sciences
67 rdf:type schema:DefinedTerm
68 anzsrc-for:0299 schema:inDefinedTermSet anzsrc-for:
69 schema:name Other Physical Sciences
70 rdf:type schema:DefinedTerm
71 sg:person.015162055621.34 schema:affiliation https://www.grid.ac/institutes/grid.24434.35
72 schema:familyName Woollam
73 schema:givenName John A.
74 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.015162055621.34
75 rdf:type schema:Person
76 sg:person.07451362255.47 schema:affiliation https://www.grid.ac/institutes/grid.24434.35
77 schema:familyName Snyder
78 schema:givenName Paul G.
79 schema:sameAs https://app.dimensions.ai/discover/publication?and_facet_researcher=ur.07451362255.47
80 rdf:type schema:Person
81 https://doi.org/10.1016/0038-1101(88)90091-3 schema:sameAs https://app.dimensions.ai/details/publication/pub.1026149857
82 rdf:type schema:CreativeWork
83 https://doi.org/10.1016/0040-6090(86)90212-9 schema:sameAs https://app.dimensions.ai/details/publication/pub.1038521396
84 rdf:type schema:CreativeWork
85 https://doi.org/10.1063/1.1141417 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057669088
86 rdf:type schema:CreativeWork
87 https://doi.org/10.1063/1.337695 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057943888
88 rdf:type schema:CreativeWork
89 https://doi.org/10.1063/1.342491 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057949781
90 rdf:type schema:CreativeWork
91 https://doi.org/10.1063/1.344765 schema:sameAs https://app.dimensions.ai/details/publication/pub.1057953256
92 rdf:type schema:CreativeWork
93 https://www.grid.ac/institutes/grid.24434.35 schema:alternateName University of Nebraska–Lincoln
94 schema:name Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511, USA
95 rdf:type schema:Organization
 




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