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    "description": "The TiB2/TiN and TiB2/B4C films with a thickness of approximately 1\u20132 \u03bcm were prepared by magnetron non-reactive d.c./r.f. sputtering on Si and stainless steel substrates. Sintered and hot-pressed targets of the individual compounds (TiB2, TiN and B4C) and their mixtures (25/75, 50/50 and 75/25 in weight percents) were used in the film preparation. These films were deposited without and with additional external magnetic fields. The films were characterized by means of their chemical composition, structure, grain size and microhardness. The main result of the experiments is the increase of hardness by 15\u201365% as revealed both for crystalline films and amorphous ones. The AFM images also showed a more fine-grained morphology for the film deposited with external magnetic field. In the case of crystalline films, the decrease of grain size and especially of standard deviation of the grain size values were also fixed. Some samples were vacuum-annealed up to 1000\u00b0C.", 
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