George H Gilmer

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George H



Publications in SciGraph latest 50 shown

  • 2013-06-11 Atomistics of vapour–liquid–solid nanowire growth in NATURE COMMUNICATIONS
  • 2005 Basic Monte Carlo Models: Equilibrium and Kinetics in HANDBOOK OF MATERIALS MODELING
  • 2004 Feature-Scale to Wafer-Scale Modeling and Simulation of Physical Vapor Deposition in DISPERSIVE TRANSPORT EQUATIONS AND MULTISCALE MODELS
  • 2002-10 Watching nanoclusters nucleate in NATURE MATERIALS
  • 2001-03 Multiscale Modeling of Thin-Film Deposition: Applications to Si Device Processing in MRS BULLETIN
  • 2001 Atomistic Modeling of Amorphization in Silicon in MRS ADVANCES
  • 2000-10 Atomistic simulation of texture competition during thin film deposition in SCIENTIFIC MODELING AND SIMULATION SMNS
  • 2000-06 Simulation of Defects and Diffusion Phenomena in Silicon in MRS BULLETIN
  • 2000 Atomistic Modeling of Complex Silicon Processing Scenarios in MRS ADVANCES
  • 2000 The Influence of Clusters on Vapor-Deposited thin Films: Atomistic Simulations in MRS ADVANCES
  • 2000 The Effect of Carbon/Self-Interstitial Clusters on Carbon Diffusion in Silicon Modeled by Kinetic Monte Carlo Simulations in MRS ADVANCES
  • 1999 Growth and Structure of Metallic Barrie Laye and Interconnect Films I: Exeriments in MRS ADVANCES
  • 1999 Growth and Structure of Metallic Barrier Layers and Interconnect Films II: Atomistic Simulations of Film Deposition onto Inclined Surfaces in MRS ADVANCES
  • 1999 Growth and Structure of Metallic Barrier Layer and Interconnect Films I: Exeriments in MRS ADVANCES
  • 1999 Numerical Simulations of Topographic Evolution for Sputter Deposition into Trenches and Vias in MRS ADVANCES
  • 1999 Multi-lattice Monte Carlo model of thin films in SCIENTIFIC MODELING AND SIMULATION SMNS
  • 1998 Monte Carlo Atomistic Simulation of Polycrystalline Aluminum Deposition in MRS ADVANCES
  • 1998 Simulators of Thin Film Deposition for Silicon Device Processing in MRS ADVANCES
  • 1998 Multiscale Modeling of the Implantation and Annealing of Silicon Devices in SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES 1998
  • 1998 Atomistic Modeling of Point and Extended Defects in Crystalline Materials in MRS ADVANCES
  • 1997 Atomistic Model of Transient Enhanced Diffusion and Clustering of Boron In Silicon in MRS ADVANCES
  • 1996 Evolution of Surface Roughness During CVD Growth in MRS ADVANCES
  • 1996 Interstitial Defect Reactions In Silicon in MRS ADVANCES
  • 1995 Atomic Scale Simulations of Arsenic Ion Implantation and Annealing in Silicon in MRS ADVANCES
  • 1995 Properties of Point-Defects in Si for Process Modeling in MRS ADVANCES
  • 1995 Simulations of SI(100) Growth: Step Flow and Low Temperature Growth in MRS ADVANCES
  • 1993 Point defect Production, Geometry and Stability in Silicon: a Molecular Dynamics Simulation Study in MRS ADVANCES
  • 1992 Surface Diffusion: Atomistics and Surface Morphology (Summary of MRS Symposium B Panel Discussion) in MRS ADVANCES
  • 1991 Molecular Dynamics Studies of Impurity Segregation and Trapping. in MRS ADVANCES
  • 1988 Molecular Dynamics Studies of Silicon Solidification and Melting in MRS ADVANCES
  • 1987-06 Models of Thin Film Growth Modes in JOM
  • 1987 Molecular Dynamics Studies of Semiconductor Thin Films and Interfaces in MRS ADVANCES
  • 1987 Role of Film-Substrate Interaction in Determining the Morphology of Thin Films in MRS ADVANCES
  • 1983 Computer Models of Rapid Solidification in MRS ADVANCES
  • 1982 Ising Model Simulations Of Impurity Trapping in Silicon in MRS ADVANCES
  • 1980 Explosive Crystallization of Amorphous Germanium Films in MRS ADVANCES
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