Zohreh Ghorannevis


Ontology type: schema:Person     


Person Info

NAME

Zohreh

SURNAME

Ghorannevis

Publications in SciGraph latest 50 shown

  • 2018-09 Anodic Growth and Characterization of Highly Nitrogen Doped Titanium Dioxide Nanotubes with Ordered Structure on Hot Argon DC Plasma Treated Titanium Substrates in JOURNAL OF INORGANIC AND ORGANOMETALLIC POLYMERS AND MATERIALS
  • 2018-05 Decoration of MWNTs by CdS Nanoparticles Using Magnetron Sputtering Method in SILICON
  • 2018-03 Effect of Ti Substrate Ion Implantation on the Physical Properties of Anodic TiO2 Nanotubes in JOURNAL OF THE KOREAN PHYSICAL SOCIETY
  • 2017-09 Effects of various applied voltages on physical properties of TiO2 nanotubes by anodization method in JOURNAL OF THEORETICAL AND APPLIED PHYSICS
  • 2017-06 Effect of different electrolyte concentrations on TiO2 anodized nanotubes physical properties in APPLIED PHYSICS A
  • 2017-03 Investigation of annealing temperature effect on magnetron sputtered cadmium sulfide thin film properties in JOURNAL OF THEORETICAL AND APPLIED PHYSICS
  • 2016-09 Effects of various deposition times and RF powers on CdTe thin film growth using magnetron sputtering in JOURNAL OF THEORETICAL AND APPLIED PHYSICS
  • 2016-04 Erratum to: The Effects of Growth Time on WO3 Nanostructure Synthesized by HFCVD Method in JOURNAL OF FUSION ENERGY
  • 2015-12 Investigation of Effective Parameters on Metal Nitride Deposition by Plasma Focus Device: Number of Shots and Substrate Axial and Angular Positions in JOURNAL OF FUSION ENERGY
  • 2015-12 Structural and morphological properties of ITO thin films grown by magnetron sputtering in JOURNAL OF THEORETICAL AND APPLIED PHYSICS
  • 2015-11 Magnetron Sputtered AZO Thin Film Preparation for the Solar Cells Applications in JOURNAL OF INORGANIC AND ORGANOMETALLIC POLYMERS AND MATERIALS
  • 2015-10 The Effects of Growth Time on WO3 Nanostructure Synthesized by HFCVD Method in JOURNAL OF FUSION ENERGY
  • 2015-03 Effect of substrate temperature on structural, morphological and optical properties of deposited Al/ZnO films in JOURNAL OF THEORETICAL AND APPLIED PHYSICS
  • 2014-09 Chromium thin film deposition on ITO substrate by RF sputtering in JOURNAL OF THEORETICAL AND APPLIED PHYSICS
  • 2012-10 Using Mather-Type Plasma Focus Device for Fabrication of Tungsten Thin Films in JOURNAL OF FUSION ENERGY
  • 2011-12 Preparation of Titanium Carbide Thin Film Using Plasma Focus Device in JOURNAL OF FUSION ENERGY
  • 2011-10 Structural and Morphological Investigations of Deposited Tungsten Nitride Thin Films Using Plasma Focus Device in JOURNAL OF FUSION ENERGY
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