John Preston


Ontology type: schema:Person     


Person Info

NAME

John

SURNAME

Preston

Publications in SciGraph latest 50 shown

  • 2011-02 The rapid prototyping of textured amorphous surfaces for the graphoepitaxial deposition of CdTe films using focused ion beam lithography in APPLIED PHYSICS A
  • 2010-01 (100) MgAl2O4 as a lattice-matched substrate for the epitaxial thin film deposition of the relaxor ferroelectric PMN-PT in APPLIED PHYSICS A
  • 2009-08 The role of substrate surface termination in the deposition of (111) CdTe on (0001) sapphire in APPLIED PHYSICS A
  • 2008-03 Laser drilling of high aspect ratio holes in copper with femtosecond, picosecond and nanosecond pulses in APPLIED PHYSICS A
  • 2007-12 Ripple formation during deep hole drilling in copper with ultrashort laser pulses in APPLIED PHYSICS A
  • 2007-01 Femtosecond laser-based fabrication of a new model material to study fracture in APPLIED PHYSICS A
  • 2006-06 The role of lattice mismatch in the deposition of CdTe thin films in JOURNAL OF ELECTRONIC MATERIALS
  • 1999-12 The Infrared Hall Effect in YBCO: Temperature and Frequency Dependence of Hall Scattering in JOURNAL OF LOW TEMPERATURE PHYSICS
  • 1998-11 Low temperature penetration depth and the effect of quasi-particle scattering measured by millimeter wave transmission in YBa2Cu3O7−δ thin films in THE EUROPEAN PHYSICAL JOURNAL B
  • 1998-04 Penetration depth from far-infrared transmission in YBa2Cu3O7 thin films in IL NUOVO CIMENTO D
  • 1996-03 Flux dynamics in thin films of YBa2Cu3O7−δ in CZECHOSLOVAK JOURNAL OF PHYSICS
  • 1996-02 Picosecond photoresponse of YBa2Cu3O7−x thin films in CZECHOSLOVAK JOURNAL OF PHYSICS
  • 1990 Picosecond Imaging of Photoexcited-Carrier Transport in GaAs/AlGaAs Multiple Quantum Wells in ULTRAFAST PHENOMENA VII
  • 1990 Pattern Formation during CW Laser Melting of Silicon in PATTERNS, DEFECTS AND MATERIALS INSTABILITIES
  • 1987 Nonequilibrium Phases and Phase Transitions in the Surface Melt Morphology of Laser Irradiated Silicon in INTERFACES UNDER LASER IRRADIATION
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