Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and ...


Ontology type: sgo:Patent     


Patent Info

DATE

2017-10-10T00:00

AUTHORS

Steven A. Miller , Prabhat Kumar , Richard Wu , Shuwei Sun , Stefan Zimmermann , Olaf Schmidt-Park

ABSTRACT

In various embodiments, a sputtering target initially formed by ingot metallurgy or powder metallurgy and rejuvenated by, e.g., cold spray, is utilized in sputtering processes to produce metallic thin films.

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