Methods of forming sputtering targets


Ontology type: sgo:Patent     


Patent Info

DATE

2012-06-12T00:00

AUTHORS

Steven A. Miller , Olaf Schmidt-Park , Prabhat Kumar , Richard Wu , Shuwei Sun , Stefan Zimmermann

ABSTRACT

In various embodiments, sputter-target formation includes application of a layer having an intermediate coefficient of thermal expansion between the backing plate and the target material.

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