Low-energy method for fabrication of large-area sputtering targets


Ontology type: sgo:Patent     


Patent Info

DATE

2011-03-22T00:00

AUTHORS

Stefan Zimmermann , Steve A. Miller , Prabhat Kumar , Mark Gaydos

ABSTRACT

In various embodiments, large-area sputtering targets are formed by providing a plurality of sputtering targets each comprising a backing plate and a refractory metal layer disposed thereon, and spray depositing a refractory metal powder on an interface between the sputtering targets, the refractory metal powder consisting essentially of the same metal as each refractory metal layer, thereby joining the refractory metal layers of the sputtering targets. More... »

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