Imprint lithographic method for making a polymeric structure


Ontology type: sgo:Patent     


Patent Info

DATE

2010-04-27T00:00

AUTHORS

Jarrett Dumond , Hong Yee Low

ABSTRACT

An imprint lithographic method for making a polymeric structure comprising the steps of: (a) providing a mold having a shape forming a mold pattern;(b) providing a substrate having a higher surface energy relative to said mold;(c) providing a polymer film on said mold, said polymer film having a selected thickness, wherein the selected thickness of the polymer film on the mold pattern is capable of forming at least one frangible region in the polymer film having a thickness that is less than the remainder of the polymer film;(d) pressing the mold and the substrate relatively toward each other to form said frangible region; and(e) releasing at least one of said mold and said substrate from the other, wherein after said releasing, said frangible region remains substantially attached to said mold while the remainder of said polymer film forms the polymeric structure attached to said substrate. More... »

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    • (d) pressing the mold and the substrate relatively toward each other to form said frangible region; and
    • (e) releasing at least one of said mold and said substrate from the other, wherein after said releasing, said frangible region remains substantially attached to said mold while the remainder of said polymer film forms the polymeric structure attached to said substrate.
\n

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