Composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom


Ontology type: sgo:Patent     


Patent Info

DATE

N/A

AUTHORS

Kenneth J. Bruza , James P. Godschalx , Edward O. Shaffer, II , Dennis W. Smith, Jr. , Paul H. Townsend, III , Kevin J. Bouck , Qing Shan J. Niu

ABSTRACT

A suitable cross-linkable matrix precursor and a poragen can be treated to form a porous cross-linked matrix having a Tg of greater than 300° C. The porous matrix material has a lower dielectric constant than the corresponding non-porous matrix material, making the porous matrix material particularly attractive for a variety of electronic applications including integrated circuits, multichip modules, and flat panel display devices. More... »

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