Development of Reactive Plasma Spray Process for Fabrication of High Quality Aluminum Nitride Coating View Homepage


Ontology type: schema:MonetaryGrant     


Grant Info

YEARS

2009-2010

FUNDING AMOUNT

4550000 JPY

ABSTRACT

Aluminum nitride (AlN) possesses high thermal conductivity with dielectric property. AlN is very useful in several applications though it hasn't been developed a thick coating process. In this research, AlN coating was successfully fabricated by reactive plasma spray using nitrogen/hydrogen plasma for the reaction of feedstock aluminum or alumina powders. The crystal of the AlN coating was cubic structure which is similar to aluminum oxynitride. It became clear that the nitrding process of feedstock powder is through oxynitride phase during flight in the plasma. More... »

URL

https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-21760583

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